PENGARUH DOSIS IMPLANTASI ION NITROGEN PADA SIFAT KAPASITANSI POLIMER PVDF DAN PVDF-HFP
), Darsono Darsono(2), Damar Yoga Kusuma(3),
(1) Universitas Ahmad Dahlan
(2) PSTA-BATAN
(3) Fisika F-MIPA UAD
Corresponding Author
Abstract
Material berdensitas energi elektrik tinggi sebagai bahan dielektrik kapasitor sangat diperlukan dalam industri bidang elektronika. Tujuan penelitian ini ialah mengkarakterisasi dan menganalisis polimer PVDF( Poly vinylidene fluorde) dan PVDF-HFP (Poly vinylidene fluoride-co-hexafluoropropene) sebelum dan sesudah diimplan ion nitrogen. Metode penelitian yang dilakukan ialah menyiapkan sampel lapisan tipis Polimer PVDFdan PVDF-HFP kemudian diimplan menggunakan ion nitrogen pada dosis 4,69 x 1016 ion/cm2 hingga 1,41 x 1018 ion/cm2 pada energi 10 keV. Selanjutnya nilai kapasitansi, faktor disipasi dan kekuatan dielektrik sampel dikarakterisasi menggunakan LCR meter GW-Instek 800. Morfologi dan ikatan struktur dari sampel dikarakterisasi menggunakan SEM dan FTIR. Hasil percobaan menunjukkan bahwa terjadi peningkatan nilai kapasitansi sebesar 4,3 kali pada polimer PVDF dan 1,4 kali pada polimer PVDF-HPF. Peningkatan nilai kapasitansi disebabkan bertambahnya ikatan rangkap C=C pada PVDF dan PVDF-HFP yang diimplan ion nitrogen. Hal tersebut dibuktikan dari hasil karakterisasi FTIR dan SEM. Namun demikian nilai kekuatan dielektrik mengalami penurunan akibat semakin konduktifnya polimer PVDF dan PVDF-HPF. Untuk sampel PVDF ada kapasitansi optimum dicapai pada dosis 9,38 x 1017 ion/cm2 sedangkan untuk sampel PVDF-HFP diatas dosis tersebut memperlihatkan gejala saturasi. Nilai kapasitansi optimal diperoleh berturut-turut sebesar 0,089483 nF, faktor disipasi 0,129613 % pada polimer PVDF dan 0,134889 nF, faktor disipasi 0,09784 % untuk polimer PVDF-HFP.
Keywords
References
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DOI: 10.17146/gnd.2018.21.2.4486
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