KARAKTERISTIK ARUS FILM TIPIS CeO2 DAN Nd-CeO2 YANG DIDEPOSISIKAN DI ATAS SUBSTRAT Si(100) MENGGUNAKAN TEKNIK PULSED-LASER ABLATION DEPOSITION (PLAD)

Iis Nurhasanah; Khairurrijal Khairurrijal; Mikrajudin Abdullah; Bambang Ariwahjoedi; Maman Budiman; Sukirno Sukirno

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About The Authors

Iis Nurhasanah
Jurusan Fisika FMIPA - UNDIP Jl. Prof. H. Soedarto, SH, Tembalang, Semarang 50275 K.K. Fisika Material Elektroni - ITB Jl. Ganesha No. 10, Bandung 40132
Indonesia

Khairurrijal Khairurrijal
K.K. Fisika Material Elektroni - ITB Jl. Ganesha No. 10, Bandung 40132
Indonesia

Mikrajudin Abdullah
K.K. Fisika Material Elektroni - ITB Jl. Ganesha No. 10, Bandung 40132
Indonesia

Bambang Ariwahjoedi
K. K. Kimia Inorganik dan Fisik, FMIPA - ITB Jl. Ganesha No. 10, Bandung 40132
Indonesia

Maman Budiman
K.K. Fisika Material Elektroni - ITB Jl. Ganesha No. 10, Bandung 40132
Indonesia

Sukirno Sukirno
K.K. Fisika Material Elektroni - ITB Jl. Ganesha No. 10, Bandung 40132
Indonesia

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