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STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING

Setyo Purwanto(1), Isao Sakamoto(2), M. Koike(3), H. Tanoue(4),


(1) R&D Centrefor Materials Science and Technology-BA TAN Kawasan Puspiptek, Serpong, Tangerang 15314
(2) Photonics Research Institute, AIST—JAPAN'
(3) Photonics Research Institute, AIST—JAPAN'
(4) Photonics Research Institute, AIST—JAPAN'
Corresponding Author

Abstract


STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING. Helicon plasma sputtering method has been used to grown the Fe/Si multilayer (MLs) with various thickness of Silicon spacer around 0.5 ~ 2nm for Fe thickness fixed at 2nm in order to investigated the antiferromagnetic coupling behaviour. Also we grown the MLs with various Fe thickness around 2-5nm for Silicon spacer fixed at tSi =l nm and l.5nm. Present study found that in case of Silicon spacer thickness tSi= l nm multilayer film exhibit antiferromagnetically ordering, beside this thickness the MLs are ferromagnetic. The maximum magnetoresistance ratio is 0.22%, it appears at the Fe thickness tFe=3nm and Si thickness tSi=l nm.

Keywords


Fe/Si Multilayer, structural and magnetic properties, helicon plasma Sputtering, magnetoresistance

Full Text: PDF (Bahasa Indonesia)

DOI: 10.17146/jusami.2003.5.1.5201